@prefix prodottidellaricerca: . @prefix istituto: . @prefix prodotto: . istituto:CDS052 prodottidellaricerca:prodotto prodotto:ID322637 . @prefix pubblicazioni: . @prefix unitaDiPersonaleInterno: . unitaDiPersonaleInterno:MATRICOLA6183 pubblicazioni:autoreCNRDi prodotto:ID322637 . @prefix modulo: . modulo:ID2455 prodottidellaricerca:prodotto prodotto:ID322637 . @prefix rdf: . @prefix retescientifica: . prodotto:ID322637 rdf:type retescientifica:ProdottoDellaRicerca , prodotto:TIPO1101 . @prefix rdfs: . prodotto:ID322637 rdfs:label "Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology (Articolo in rivista)"@en . @prefix xsd: . prodotto:ID322637 pubblicazioni:anno "2015-01-01T00:00:00+01:00"^^xsd:gYear ; pubblicazioni:doi "10.1117/1.OE.54.3.035101"^^xsd:string . @prefix skos: . prodotto:ID322637 skos:altLabel "
Zdenko Z\u00E1pra?n\u00FD\nDu?an Koryt\u00E1r\nMatej Jergel\nPeter ?iffalovic?\nEdmund Dobroc?ka\nPatrik Vagovic?\nClaudio Ferrari\nPetr Mikul\u00EDk\nMaksym Demydenko\nMarek Miklo?ka (2015)
Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology
in Optical engineering (Bellingham, Print); SPIE-INT SOC OPTICAL ENGINEERING, BELLINGHAM, WA 98227-0010 (Stati Uniti d'America)
"^^rdf:HTML ; pubblicazioni:autori "Zdenko Z\u00E1pra?n\u00FD\nDu?an Koryt\u00E1r\nMatej Jergel\nPeter ?iffalovic?\nEdmund Dobroc?ka\nPatrik Vagovic?\nClaudio Ferrari\nPetr Mikul\u00EDk\nMaksym Demydenko\nMarek Miklo?ka"^^xsd:string ; pubblicazioni:paginaInizio "035101-1"^^xsd:string ; pubblicazioni:paginaFine "035101-12"^^xsd:string ; pubblicazioni:numeroVolume "54"^^xsd:string . @prefix ns11: . prodotto:ID322637 pubblicazioni:rivista ns11:ID306897 ; pubblicazioni:pagineTotali "12"^^xsd:string ; pubblicazioni:numeroFascicolo "3"^^xsd:string ; pubblicazioni:affiliazioni "Slovak Academy of Sciences, Institute of Electrical Engineering, D\u00FAbravsk\u00E1 cesta 9, 845 11 Bratislava, Slovakia\nSlovak Academy of Sciences, Institute of Physics, D\u00FAbravsk\u00E1 cesta 9, 845 11 Bratislava, Slovakia\nDESY, Center for Free-Electron Laser Science, Notkestrasse 85, 226 07 Hamburg, Germany\nCNR-IMEM Institute, Parco Area delle Scienze 37/A, 431 24 Parma, Italy\nMasaryk University, Central European Institute of Technology, Kotl\u00E1?ska 2, 611 37 Brno, Czech Republic\nSumy State University, R.-Korsakov Str. 2, 40007 Sumy, Ukraine\nIntegra TDS, s.r.o., Pod P\u00E1rovcami 4757/25, 921 01 Pie?t'any, Slovakia"^^xsd:string ; pubblicazioni:titolo "Calculations and surface quality measurements of high-asymmetry angle x-ray crystal monochromators for advanced x-ray imaging and metrology"^^xsd:string ; prodottidellaricerca:abstract "We present the numerical optimization and the technological development progress of x-ray optics\nbased on asymmetric germanium crystals. We show the results of several basic calculations of diffraction properties\nof germanium x-ray crystal monochromators and of an analyzer-based imaging method for various asymmetry\nfactors using an x-ray energy range from 8 to 20 keV. The important parameter of highly asymmetric\nmonochromators as image magnifiers or compressors is the crystal surface quality. We have applied several\ncrystal surface finishing methods, including advanced nanomachining using single-point diamond turning\n(SPDT), conventional mechanical lapping, chemical polishing, and chemomechanical polishing, and we have\nevaluated these methods by means of atomic force microscopy, diffractometry, reciprocal space mapping, and\nothers. Our goal is to exclude the chemical etching methods as the final processing technique because it causes\nsurface undulations. The aim is to implement very precise deterministic methods with a control of surface roughness\ndown to 0.1 nm. The smallest roughness (~0.3 nm), best planarity, and absence of the subsurface damage\nwere observed for the sample which was machined using an SPDT with a feed rate of 1 mm/min and was\nconsequently polished using a fine polishing 15-min process with a solution containing SiO2 nanoparticles\n(20 nm)"@en . @prefix ns12: . prodotto:ID322637 pubblicazioni:editore ns12:ID12276 ; prodottidellaricerca:prodottoDi istituto:CDS052 , modulo:ID2455 ; pubblicazioni:autoreCNR unitaDiPersonaleInterno:MATRICOLA6183 . @prefix parolechiave: . prodotto:ID322637 parolechiave:insiemeDiParoleChiave . ns11:ID306897 pubblicazioni:rivistaDi prodotto:ID322637 . ns12:ID12276 pubblicazioni:editoreDi prodotto:ID322637 . parolechiave:insiemeDiParoleChiaveDi prodotto:ID322637 .