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Istituto sull'inquinamento atmosferico

Torna all'elenco Contributi in rivista anno 2014

Contributo in rivista

Tipo: Articolo in rivista

Titolo: ZnO nanowires strips growth: Template reliability and morphology study

Anno di pubblicazione: 2014

Autori: Pea M.; Maiolo L.; Pilloton R.; Rinaldi A.; Araneo R.; Giovine E.; Orsini A.; Notargiacomo A.

Affiliazioni autori: Istituto di Fotonica e Nanotecnologie - CNR, Via Cineto Romano 42, I-00156-Roma, Italy; Istituto per la Microelettronica e i Microsistemi - CNR, I-Roma-00133, Italy; University of l'Aquila, International Research Center for Mathematics and Mechanics of Complex System (MEMOCS), Cisterna di Latina, LT 04012, Italy; ENEA, C.R. Casaccia, Santa Maria di Galeria, Rome 00123, Italy; Sapienza University of Rome, Rome 00185, Italy; University of Rome Tor Vergata, Department of Electronic Engineering, Rome 00173, Italy

Autori CNR:

  • ENNIO GIOVINE
  • LUCA MAIOLO
  • ANDREA NOTARGIACOMO
  • MARIALILIA PEA
  • ROBERTO PILLOTON

Lingua: inglese

Abstract: In this work we report on hydrothermal growth of ZnO nanostructures obtained by using strip-shaped resist templates made by electron beam lithography, with particular focus on: (i) the effects of materials used and processing on the template adhesion and its stability during wet growth; (ii) the influence of the template pattern dimensions on the nanowires morphology. Templates made of patterned films with methylmethacrylate-methacrylic acid copolymer showed greater adhesion and stability with respect to the commonly used poly (methylmethacrylate) electron resist or to the use of thin adhesion-promoter photoresist layers. The growth of nanowires in strip-shaped methyl methacrylate-methacrylic acid copolymer templates has been investigated using typical hydrothermal growth parameters and a marked dependence of nanowires length and diameter has been found on the template size for strips narrower than about 2 ?m. © 2014 Elsevier B.V. All rights reserved.

Lingua abstract: inglese

Pagine da: 147

Pagine a: 152

Rivista:

Microelectronic engineering North-Holland
Paese di pubblicazione: Paesi Bassi
Lingua: inglese
ISSN: 0167-9317

Numero volume: 121

DOI: 10.1016/j.mee.2014.04.045

Indicizzato da: Scopus [2-s2.0-84901436027]

Parole chiave:

  • Electron beam lithography
  • Hydrothermal growth
  • Nanowires
  • Resist adhesion
  • Zinc oxide

URL: http://www.scopus.com/inward/record.url?eid=2-s2.0-84901436027&partnerID=q2rCbXpz

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